電子氣體
蝕刻氣體(ETCHANT GASES)
BCl3
≥99.999%
Cl2
CHF3
C2F6
C3F8
C4F8
HBr
HCl
SF6
NF3
≥99.99%
沉積氣體(SILICON PRECURSOR GASES)
SiH2Cl2
≥99.7%
Si2H6
≥99.998%
GeH4
GeF4
≥99.95%
SiH3CH3
≥99%
SiH4
≥99.9999%
SiCl4
≥99.98%
SiF4
SiHCl3
反應氣體(REACTANT GASES)
NH3
≥99.99999%
CO2
CO
≥99.997%
N2O
≥99.9995%
WF6
摻雜氣體(DOPANT GASES)
AsH3
BF3
≥99.995%
B2H6
PH3
TMB
≥99.5%